Por favor, use este identificador para citar o enlazar este ítem: http://repositoriodigital.ipn.mx/handle/123456789/11462
Título : Structural and optical characterization of GaNAs layers grown by molecular beam epitaxy
Palabras clave : MBE
GaNAs LAYERS
Fecha de publicación : 16-ene-2013
Editorial : American Vacuum Society
Descripción : We have grown GaNxAs1−x layers by molecular beam epitaxy on GaAs 100 substrates using a radio frequency plasma nitrogen source and solid sources for Ga and As. Employing reflection high-energy electron diffraction RHEED , the GaNAs growth mode was in situ monitored. A three dimensional 3D growth mode was obtained at the low growth temperature of 420 °C. At higher temperatures streaky RHEED patterns were observed during all the GaNAs deposition, indicating a two dimensional 2D growth mode. The structural and optical properties of the GaNAs layers were studied by employing high-resolution x-ray diffraction, atomic force microscopy, Raman scattering, and spectroscopic ellipsometry. The films grown in a 3D mode presented high density of crystal defects, degraded structural properties, and broad optical transitions. In contrast, GaNAs layers grown in a 2D mode are pseudomorphic with high crystal quality. The properties of samples with a high N concentration were improved by first growing a GaNAs layer with a low N content.
INVESTIGACION
INSTITUTO POLITECNICO NACIONAL
URI : http://www.repositoriodigital.ipn.mx/handle/123456789/11462
Otros identificadores : J. Vac. Sci. Technol. B 24 (3), 1591-1594, 2006
1071-1023
http://hdl.handle.net/123456789/1011
Aparece en las colecciones: Doctorado

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