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dc.creatorPulzara-Mora, A.-
dc.creatorMeléndez-Lira, M.-
dc.creatorFalcony-Guajardo, C.-
dc.creatorLópez-López, M.-
dc.creatorVidal, M. A.-
dc.creatorJiménez-Sandoval, S.-
dc.creatorAguilar-Frutis, M. A.-
dc.date2012-03-29T00:00:51Z-
dc.date2012-03-29T00:00:51Z-
dc.date2006-05-31-
dc.date.accessioned2013-01-16T15:38:08Z-
dc.date.available2013-01-16T15:38:08Z-
dc.date.issued2013-01-16-
dc.identifierJ. Vac. Sci. Technol. B 24 (3), 1591-1594, 2006-
dc.identifier1071-1023-
dc.identifierhttp://hdl.handle.net/123456789/1011-
dc.identifier.urihttp://www.repositoriodigital.ipn.mx/handle/123456789/11462-
dc.descriptionWe have grown GaNxAs1−x layers by molecular beam epitaxy on GaAs 100 substrates using a radio frequency plasma nitrogen source and solid sources for Ga and As. Employing reflection high-energy electron diffraction RHEED , the GaNAs growth mode was in situ monitored. A three dimensional 3D growth mode was obtained at the low growth temperature of 420 °C. At higher temperatures streaky RHEED patterns were observed during all the GaNAs deposition, indicating a two dimensional 2D growth mode. The structural and optical properties of the GaNAs layers were studied by employing high-resolution x-ray diffraction, atomic force microscopy, Raman scattering, and spectroscopic ellipsometry. The films grown in a 3D mode presented high density of crystal defects, degraded structural properties, and broad optical transitions. In contrast, GaNAs layers grown in a 2D mode are pseudomorphic with high crystal quality. The properties of samples with a high N concentration were improved by first growing a GaNAs layer with a low N content.-
dc.descriptionINVESTIGACION-
dc.descriptionINSTITUTO POLITECNICO NACIONAL-
dc.languageen-
dc.publisherAmerican Vacuum Society-
dc.subjectMBE-
dc.subjectGaNAs LAYERS-
dc.titleStructural and optical characterization of GaNAs layers grown by molecular beam epitaxy-
dc.typeArticle-
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