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http://repositoriodigital.ipn.mx/handle/123456789/10810
Título : | Photoacoustic thermal characterization of spark‐processed porous silicon |
Palabras clave : | Porous silicon Thermal characterization |
Fecha de publicación : | 16-ene-2013 |
Editorial : | Journal of Applied Physics |
Descripción : | A non‐separation approach to determine the spark‐processed porous silicon thermal parameters is presented. This thermal characterization was
performed through application of the photoacoustic technique, in combination with compositional models for spark‐processed porous silicon samples.
The thermal parameters obtained are in agreement with existing studies about the composition of this material. This approach opens the possibility
of performing the thermal characterization of other porous semiconductors and analogous materials. © 1996 American Institute of Physics. Research article of journal indexed in ISI database CONACYT-Mexico |
URI : | http://www.repositoriodigital.ipn.mx/handle/123456789/10810 |
Otros identificadores : | 0021-8979 http://hdl.handle.net/123456789/317 |
Aparece en las colecciones: | Doctorado |
Ficheros en este ítem:
Fichero | Descripción | Tamaño | Formato | |
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1996 JAP v79 p8951.pdf | 74.16 kB | Adobe PDF | Visualizar/Abrir |
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