Photoacoustic thermal characterization of spark‐processed porous silicon

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Campo DC	Valor	Lengua/Idioma
dc.creator	Cruz Orea, A.	-
dc.creator	Delgadillo, I.	-
dc.creator	Vargas, H.	-
dc.creator	Gudiño Martinez, A.	-
dc.creator	Marin, E.	-
dc.creator	Vazquez Lopez, C.	-
dc.creator	Calderon, A.	-
dc.creator	Alvarado Gil, J. J.	-
dc.date	2012-03-25T06:41:55Z	-
dc.date	2012-03-25T06:41:55Z	-
dc.date	1996-06	-
dc.date.accessioned	2013-01-16T10:08:24Z	-
dc.date.available	2013-01-16T10:08:24Z	-
dc.date.issued	2013-01-16	-
dc.identifier	0021-8979	-
dc.identifier	http://hdl.handle.net/123456789/317	-
dc.identifier.uri	http://www.repositoriodigital.ipn.mx/handle/123456789/10810	-
dc.description	A non‐separation approach to determine the spark‐processed porous silicon thermal parameters is presented. This thermal characterization was performed through application of the photoacoustic technique, in combination with compositional models for spark‐processed porous silicon samples. The thermal parameters obtained are in agreement with existing studies about the composition of this material. This approach opens the possibility of performing the thermal characterization of other porous semiconductors and analogous materials. © 1996 American Institute of Physics.	-
dc.description	Research article of journal indexed in ISI database	-
dc.description	CONACYT-Mexico	-
dc.language	en_US	-
dc.publisher	Journal of Applied Physics	-
dc.subject	Porous silicon	-
dc.subject	Thermal characterization	-
dc.title	Photoacoustic thermal characterization of spark‐processed porous silicon	-
dc.type	Article	-
Aparece en las colecciones:	Doctorado

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