Diseño de una Fuente de DC Pulsada para Sputtering.

Abstract

The commercial power sources of pulsed DC for sputtering focus their design in the control of plasma parameters, parting from monitoring changes in current and voltage of several orders of magnitude minor than the nominal design values of these power sources for determining the occurrence of arcs, thus requiring complex design concepts and consequently a very high cost. In this regard, the main contribution in this design is that it supports the use of Langmuir and/or Faraday probes for the monitoring and evolution of a plasma, for its used in the decision-making of the source switching, in conjunction with the use of DC sources and conventional high speed switching devices (MOSFETS) on the switching stage, permits the development of pulsed DC sources for sputtering and low costs without compromising the efficiency of energy coupling to the plasma.